Ohio State University has chosen advanced reactor platforms from Japanese industrial gas company Taiyo Nippon Sanso Corporation (TNSC) to spearhead research and development of nitride and oxide materials.
The acquisition includes the TNSC SR4000HT-RR-LV metal organic chemical vapour deposition (MOCVD) reactor and a halide vapour phase epitaxy (HVPE) reactor, marking a major step in Ohio State’s semiconductor capabilities.
These platforms are tailored for cutting-edge semiconductor research, claim TNSC, offering the ability to create complex epitaxial structures with exacting control over thickness and composition.
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