India’s largest industrial gases manufacturer, INOX Air Products (INOXAP), has launched the country’s first ultra-high purity (UHP) electronic grade nitrous oxide plant in Manali, Chennai.
With a capacity of 1,700 tonnes per annum (TPA), the facility delivers nitrous oxide at a 6N (99.9999%) purity level, meeting stringent specifications to minimise contamination.
The plant supports critical sectors, including semiconductors, solar photovoltaic (PV) manufacturing and electronics, by providing a reliable domestic source of nitrous oxide. The gas plays an essential role in advanced manufacturing, such as gas-phase chemical deposition for solar PV cells and semiconductors, and in the production of silicon oxide films and other materials used in electronic devices.
Siddharth Jain, Managing Director of INOX Air Products, commented, “The commissioning of India’s first Ultra-High Purity Nitrous Oxide plant is a strong testament of INOXAP’s capabilities of creating powerful assets and solutions that create tremendous value for its stakeholders.
“We are committed to make our country self-reliant while building a strong supply chain for essential gases for the electronics, solar and semiconductor segments. We are constantly evaluating opportunities to invest towards building product offerings for next-gen technology sectors which will define India’s future economic growth trajectory.”
The new plant is also a big step forward for India in cutting down its reliance on imported nitrous oxide. In 2018, the country imported 52,370 kilograms of the gas, up from 37,530 kilograms the previous year, according to CEIC data.
By producing 1,700 tonnes annually of ultra-pure nitrous oxide domestically, India can ensure a steady, high-quality supply for its semiconductor and electronics industries. This move not only stabilises the supply chain but also supports local industries and reduces vulnerabilities tied to international imports.
Nitrous oxide’s properties make it indispensable in the electronics industry. It reacts with silane or silicon precursors to create high-quality oxide films, which serve as electrical insulators in microelectronics. It is also used in the formation of low-k dielectric films and metallic oxides.
This is not the first big story to emerge from India’s industrial gas sector this week. INOXAP also announced the commissioning of its largest ASU at SAIL’s Bokaro plant. With a capacity of 2,150 tonnes per day and an investment of $87m, the ASU will help meet the ever-increasing demands of India’s critical industries, including steel production.
